Axcelis Technologies Inc. | Cash Flow

Fiscal year is January-December. All values USD Thousands.
2013
2014
2015
2016
2017
2018
Net Income before Extraordinaries
17,144.00
11,266.00
14,678.00
11,001.00
126,959.00
45,885
Depreciation, Depletion & Amortization
5,075.00
4,589.00
4,869.00
4,258.00
5,002.00
5,772
Other Funds
1,385.00
115.00
6,111.00
72.00
1,184.00
9,989
Funds from Operations
11,108.00
1,218.00
27,622.00
21,866.00
47,413.00
72,855
Changes in Working Capital
3,934.00
17,263.00
9,363.00
30,665.00
8,871.00
25,890
Net Operating Cash Flow
15,042.00
16,045.00
18,259.00
8,799.00
56,284.00
46,965
Capital Expenditures
821.00
896.00
1,830.00
2,506.00
7,285.00
Sale of Fixed Assets & Businesses
1,200.00
-
-
270.00
-
Net Investing Cash Flow
485.00
896.00
1,830.00
2,236.00
7,285.00
Issuance/Reduction of Debt, Net
15,000.00
470.00
33,171.00
146.00
-
Net Financing Cash Flow
15,720.00
2,756.00
31,422.00
2,430.00
15,070.00
Net Change in Cash
1,304.00
15,537.00
48,136.00
8,098.00
63,225.00
Free Cash Flow
15,863.00
16,941.00
16,429.00
11,305.00
48,999.00
Deferred Taxes & Investment Tax Credit
1,465.00
1,266.00
779.00
519.00
82,085.00
11,209
Other Sources
106.00
-
-
-
-
Change in Capital Stock
2,105.00
3,341.00
4,362.00
2,504.00
16,254.00
Exchange Rate Effect
141.00
1,352.00
285.00
507.00
844.00

About Axcelis Technologies

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Address
108 Cherry Hill Drive
Beverly Massachusetts 01915
United States
Employees -
Website http://www.axcelis.com
Updated 07/08/2019
Axcelis Technologies, Inc. engages in the design, manufacture and service of dry strip, ion implantation and other processing equipment used in the fabrication of semiconductor chips. The company provides service and support, including spare parts, equipment upgrades, maintenance services and customer training. Its products include Purion H, which is next generation single wafer high current implanter; Optima HDx, is designed to maximize beam current, minimize beam setup time and deliver productive process across the applications space; Purion XE, is next generation single wafer high energy implanter, it is the second tool in the expanding family of Purion ion implanters; Optima XEx, includes implant energies matched to meet the changing needs of today's advanced device manufacturing; Paradigm XE, offers implant energies matched to meet the changing needs of advanced logic and memory manufacturing; and Purion M, is a low energy, medium current ion implanter for all channel engineering applications in the low dose and mid dose regimes.